ASML
TWINSCAN NXT:1980Di
Immersion lithography scanner.
ASML
TWINSCAN EXE:5200
High-NA EUV system.
Applied Materials
Centura Sculpta
Angled etch patterning.
Lam Research
Vantex Etch
Conductor etch system.
KLA Corporation
Surfscan SP7XP
Unpatterned wafer inspection.
ASML
TWINSCAN XT:1460K
DUV immersion scanner.
Applied Materials
Producer XP CVD
Chemical vapor deposition.
Lam Research
Altus ICEFill
W CVD system.
Tokyo Electron
Tactras 3D Coater
3D coating/development.
KLA Corporation
2920 Inspection
Patterned wafer inspection.
Axcelis Technologies
Purion XE
High energy implanter.
Applied Materials
Endura PVD
Physical vapor deposition.
Lam Research
SPEED Etch
Dielectric etch system.
SCREEN
SU-3200 Batch
Batch clean system.
Tokyo Electron
TELIUS Dry Process
Dry cleaning system.
Lincoln Electric
Series G350
Industrial Series G350 for semiconductor equipment applications.
Kaeser
Series E250
Industrial Series E250 for semiconductor equipment applications.
Atlas Copco
Series A50
Industrial Series A50 for semiconductor equipment applications.
Fronius
Series K500
Industrial Series K500 for semiconductor equipment applications.
Ingersoll Rand
Series F300
Industrial Series F300 for semiconductor equipment applications.
Siemens Healthineers
Series B100
Industrial Series B100 for semiconductor equipment applications.
Grundfos
Series C150
Industrial Series C150 for semiconductor equipment applications.
Miller Electric
Series H400
Industrial Series H400 for semiconductor equipment applications.
Hypertherm
Series L600
Industrial Series L600 for semiconductor equipment applications.